Magnetron sputtering scanning method for modifying silicon carbide optical reflector surface and improving surface profile(授权发明) | |
王晋峰![]() ![]() ![]() ![]() | |
2022-05-24 | |
Rights Holder | 中国科学院南京天文光学技术研究所 |
Country | 美国 |
Subtype | 发明专利 |
Abstract | A magnetron sputtering scanning method for manufacturing a silicon carbide optical reflector surface modification layer and improving surface profile includes (1) for a silicon carbide plane mirror to be modified, first utilizing diamond micro-powders to grind and roughly polish an aspherical silicon carbide reflector with a conventional polishing or CCOS numerical control machining method; (2) after the surface profile precision of the silicon carbide reflector satisfies a modification requirement, utilizing a strip-shaped magnetron sputtering source to deposit a compact silicon modification layer on the surface of the silicon carbide reflector; (3) then, utilizing a circular sputtering source to modify and improve the surface profile of the reflector; and (4) finally, finely polishing the modification layer, and achieving the requirements for machining the surface profile and roughness of the reflector. |
Subject Area | 天文技术与方法 |
Application Date | 2018-03-30 |
Patent Number | US 11,339,468 B2 |
Language | 英语 |
Status | 已授权 |
Application Number | US201816757819 |
Document Type | 专利 |
Identifier | http://ir.niaot.ac.cn/handle/114a32/2029 |
Collection | 专利 中国科学院南京天文光学技术研究所知识成果 |
Affiliation | 南京天文光学技术研究所 |
Recommended Citation GB/T 7714 | 王晋峰,黄猛,田杰,等. Magnetron sputtering scanning method for modifying silicon carbide optical reflector surface and improving surface profile(授权发明). US 11,339,468 B2[P]. 2022-05-24. |
Files in This Item: | Download All | |||||
File Name/Size | DocType | Version | Access | License | ||
MAGNETRON SPUTTERING(548KB) | 专利 | 开放获取 | CC BY-NC-SA | View Download |
Items in the repository are protected by copyright, with all rights reserved, unless otherwise indicated.
Edit Comment